How big can we go?
In an attempt to push the cutoff higher, we annealed two wafers outside the susceptor at 1000 C (SC 066) and 1100 C (SC 067) with a ramp rate of 100 C/s.
The 1100 C does give a cutoff slightly higher ~5 nm, but I’m not sure if this is within the variability in different imaging fields. I’m currently working on imaging a membrane at several positions and calculating the deviation so we have a better idea of what the variability is.
Are 35 nm pores a physical limit i.e. zones of crystals coming into each other preventing further growth? Or would increasing the ramp rate open the pores even further?
The fact that we can ask these kind of questions means the RTP and AJA system and all the associated sweat and grief are really paying off. Woohoo!