Using Alumina Deposition to Modulate Pore Size
The Cambridge Microsystems Savannah 200 atomic layer deposition (ALD) system uses a two-step chemical process that alternates pulses of water vapor and trimethylaluminum (TMA) to build a layer of Al2O3 on a silicon substate. Because of the two-step nature of the process, the film is forced to grow by successive monolayers, each with a thickness…