30 nm Ar sputt. temp. series
As a follow up to my 15 nm post-Si deposition Ar sputter experiment, I fabricated a set of six wafers with 30 nm Si films this week: three with the Ar sputter process and three without. I annealed these at 1000, 1050 and 1100 C with a ramp rate of 100 C/s for 60 s….