Updated: 25-40-25 nm OSO SEPCONS

ByJosh Winans

We created a 25-40-25 OSO stack with a SEPCON pattern.  RTP at 1050 C 100 C/s 60 s.  The following images show a comparison between the STEM detector and the SEM detector, and then a couple more images at 100 kx and 50 kx.

25_40_25 6
6.1% porosity,   38 nm avg dia
25_40_25 5
6.4% porosity,   40 nm avg dia

 

 

25_40_25 12

25_40_25 14

25-40-25 100KX pore diameter
25-40-25 100KX pore diameter
25-40-25 50KX pore diameter
25-40-25 50KX pore diameter

 

I calculated a porosity of ~6.5 %, and avg. pore diameter of ~40 nm.

I measured a permeance of ~500 cc/cm2/s/bar and burst pressures of 1.2, 11.2, 20.2, 19.3, 21.1 psi.

Only about 50-60 % of the wafers chips were in tact after etching.  That is surprising given the relatively high burst pressures I measured.  The majority of broken membranes were located in the same region of the wafer.

Similar Posts

One Comment

  1. I updated the post. Now there are histograms of pore sizes as well as a comparison of the SEM and STEM image porosity and avg. dia.

Comments are closed.