I’ve been gathering data for a paper using my microporous MgF2 nanomembranes so here are some sample figures for such a paper.
Herein, we are trying to create a porous, Raman-compatible substrate for use in cell culture. Researchers have used Raman microspectroscopy to perform quantitative non-invasive measurements of biomolecules in cells. It’s a very exciting technique. While silicon based substrates have excellent properties for cell culture, they have strong Raman background signals and absorb a lot of laser power at the illumination wavelengths we would like to use. MgF2, Quartz, and CaF2 are considered Raman-compatible for their substantially weaker backgrounds. Researchers currently deposit or culture cells on non-permeable coverglasses made of these materials. However, we have known that cells sometimes require a permeable substrate to adopt morphologies that are more consistent with in vivo studies of morphology. So using our microporous nitride substrates, we wish to create a substrate that will have both the permeability and the Raman-compatibility necessary to facilitate more accurate Raman studies of those types of cells.
Figure 1. MgF2 nanomembrane material properties. (a)-(b) MgF2 relief pattern transfer, with cartoon crossections of microporous films (not to scale). Beginning with a freestanding film of microporous silicon nitride (a), MgF2 is evaporated onto the substrate (200 nm, 0.1-0.3 nm/sec, 250 °C, Platen Rotation), coating the porous substrate, resulting in a hybrid material. (b) The substrate is then inverted and purified using RIE (90% CHF3, 10% Oxygen, 75 mTorr, 100 W), releasing a freestanding nanoporous film of MgF2. (c) A SEM image normal to the membrane plane shows the infilling effect of the direct evaporation process, as the template pores narrow from their designed 500 nm diameters to approximately 325 nm. (d) SEM crossection of a partially etched MgF2 nanomembrane (with some template backing remaining), showing film thickness close to the targeted 200 nm.
EDS measurement of the composition of the freestanding membrane. While the Mg and F signals are preserved across the freestanding region, the Si signal is not. The membranes are >85% MgF2 in the freestanding region. As a side note, there was some sample drift, so the image is blurred. This is a 30kX image.
Before Etch
After Etch
Previous Figure with 50 nm thick nanoporous MgF2. Here the burst pressure for the 200 nm microporous MgF2 is about 7 PSI, over a 5-slot structure instead of a square window.
20X Live/Dead stain image of P6 HUVECS (Day 7) on fabricated microporous MgF2 grown in MCDB131 media. Eventually, we will use ARPE-19 Cells with tight junction staining which have a characteristic response to permeable substrates.
We will have to reestabilish the Raman background of the membranes, but the material composition looks to be the same as with my nanoporous material. HUVECS seem to stick ok without using any additional coatings.
On the 13th of September we reviewed our recent progress on EO. Maryna and Jirachai (Borkholder group) gave presentations. I’ve uploaded PDF files of each of their presentations. Maryna’s presentation: MarynaEO Jarachai’s presentation: EO_Testing_Report (PPT) EO_Testing_Report (PDF) Bubble formation in electrolytic cells
During the history of pnc-Si fabrication, we have always observed that pore formation is intimately related to the crystallization process. In general, large nanocrystals in a film correspond with larger pore diameters. A partially crystallized film will have a low density of films. Following the work that describes crystallization of a-Si in terms of kinetic…
While experimental results are still forthcoming, I thought I’d make a post about the nature of the model I’ve constructed for ECMO. This model is the one that my experiments are seeking to validate; so to be clear, this model is founded entirely in theory for now. ECMO shares some obvious similarities with hemodialysis — blood…
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In this post, I sum up all the NSN stacks with different Si thicknesses I have made so far. The nitride layer is 30nm thick for both the top and the bottom. The thickness for silicon film ranges from 7nm to 10nm, 15nm, 25nm, 50nm and 100nm. All the wafers were firstly etched and then…
Last week’s production yielded two wafers (502 & 504) with defect-free membranes. 506 had a high pinhole density. These wafers have a TEOS mask and were annealed twice; the first anneals did not produce pores so they were annealed again at 1000 C. From these results, it seems that the first anneal “seeds” pore formation…