Resistance of coated membrane cells
Samples are from wafers #316 and 318. This is the first time for wafer scale deposition. Processing conditions:1) chamber base pressure @ 6×10-7 Torr (previously @ 5×10-6 Torr)2) 15nm Ti + 15nm Au, no vacuum break Estimated “cell resistance”: about 20-25 ohm, much lower than previous measurement. Possible reasons why lower resistance is observed:1) “Au…