Production from 12.06.2007
This week’s production included wafers of antimony (Sb) and phosphorus (P) doping.
Process parameters
The deposition heater was re-brazed prior to this deposition. We were concerned with the original brazing job because there were areas with “globs” of material and cracks in the solder. The new braze covers most of the surface, and although is not perfect, does not seem to outgas any contaminants or affect vacuum performance. All wafers were held in place with a solid stainless steel backing plate (to help with temperature uniformity during the dep.)
Wafer 312, 313
- P-doped
- deposition @ 400C
- 950C RTP
Wafer 189, 190
- Sb-doped
- deposition @ 400C
- 950C RTP
Wafer 310, 311
- P-doped
- deposition @ 400C
- 975C RTP
Wafer 187, 188
- Sb-doped
- deposition @ 400C
- 975C RTP
Details on the front-end processing can be found here: JP’s flow
Pinhole density was low across all wafers, and yield after the full-wafer strip was close to 90%.
Images
(0,0) @ 50kx
wafer 310 – P – 975C RTP
(0,0) @ 50kx
It is very possible that the Sb/P wafers are seeing different temperatures in the RTP, since their optical absorptions differ (see Maryna’s figure below). In other words, the pyrometer in the RTP is seeing different temperatures as the energy passes through the wafer, which changes the feedback in the control system.







