Membrane Anneal Study: W510X, W600 Testing
I recently tested W510X and W600 described by Dave here for air permeability, rhodamine diffusion, and burst pressure. No air permeability was observed; even a sample with one very small pinhole (W600 800C anneal) only had a permeability of 11 cc/atm*cm2*s. To verify the lack of pores I performed rhodamine diffusion on the W600 700C sample.
Very little if any diffusion was seen over 20 minutes. This supports a lack of pores (which we suspect for amorphous silicion???). Lastly I performed burst pressure tests on the intact samples. The W600 700C sample broke while drying after rhodamine, and the W600 750C sample was broken when I received it, so neither could be tested.
| Burst Pressure (psi) | ||
| W600 (20nm oxide) | W510X (40nm oxide) | |
| Amorph. Anneal 700C | – | 8.65 |
| Amorph. Anneal 750C | – | 6.58 |
| Amorph. Anneal 800C | 1.68 | 14.1 |