Makerware 3d print Preview
One neat feature of the Makerware software is to visualize the printed layers before actually printing them. You can catch a lot of errors with this feature; I highly recommend it.
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Culture divider insert assembly and test
Introduction We are designing a cell culture chamber insert to allow side-by-side co-culture of cells and ultimately triculture in the µSiM devices. Materials and Methods ALine devices assembly according to the “ALine Modular Device Assembly” instructions. 2-slot NPN membranes applied (NPSN100-2L, nanoporous silicon nitride 100 nm thick, 2 windows). Straight tweezers and chip tweezers are…
Bonding PDMS to PET films
PET is a very common material used in various cell culture applications. Unfortunately it’s chemical inertness makes it immune to plasma activation, and we can’t bond PDMS devices to PET. I am working with a PET films coated with Indium Tin Oxide (ITO) on one side of the film. The film, in terms of texture,…
Monocyte Isolation via CD14+ Selection (Protocol)
Please see the attached .PDF file for a full monocyte isolation protocol. This is for isolating human monocytes from whole blood. Monocyte-Isolation-Protocol
Nanomembranes+Microfluidic PETLs Integration
Our collaborator Fernando has made a really nifty way to make microfluidics work with lamination pouches. These flat pouches can be sealed together using a heat activated glue, which can be done consistently using a $40 laminator (http://www.officedepot.com/a/products/404227/Scotch-TL-901-Thermal-Laminator/) Advantages If we could get our chips inside a flat system, we could really use vertical stacking…
New Alt. Membrane Release Recipe (Nitride RIE)
I have lost many chips during my MgF2 or Au or Pt process due to yield problems with my RIE. I have wondered if the problem was due to power spikes. I have observed that my most poorly yielding etch runs usually have uneven power or power spikes during the run. Increasing window size (active area)…
BBB Device 2.7 Fabrication with Mortar Bonding
Fabricate ITO Electrodes Deposit 2500 Angstroms, ITO, Room Temperature Using Kurt Lesker Sputterer (Use ITO Variable Recipe, takes about 1.5hr) Tape in Microscope Slides and Coverglass into Machined Shadow Mask using Kapton Tape Anneal in Toaster Oven, 450 Fahrenheit, 1hr Drops resistance from > 40 Megaohm to < 5 kohm. Measure from edge of Pad…