NSF STTR Goals
- Phase II submission August 1, 2016 or January 30, 2017
- UR Tasks – Biocompatibility by Feb. 1 2016
- Channel design optimization by November 2015
In this post, two unique five-layer structures will be discussed. The first five-layer structure is nitride/oxide/silicon/oxide/nitride (NOSON) with the deposition order from bottom to top. In this structure, the silicon film is 25nm while the nitride and oxide are both 15nm. After etching the substrate, the membrane was RTP annealed at 1000C for 1 minute….
In order to resolve the silicon nitride- silicone gasket bonding issue, I, Josh, Tucker and Greg used different approaches to functionalize the nanoporous nitride (NPN) surface. Both surfaces of NPN, although have same material (silicon nitride), behave differently. The flat side is etched using xenon fluoride to remove pncSi layer on top. Different tools at…
In order to verify the validity of the result of the five-layer structure I did last time, I deposited another wafer with NOSON stack, which has the identical thickness as that of the last time. The annealing condition is also same as the last time, which is 1 minute holding time at 1000C with a…
fornasiero2008
Discussion: The BSA may have not been fresh enough to give good data, the difference between background and signal are pretty low. The Rhodamine IgG gave better signals but the PEG4 treated SiN is between the untreated SiN and bare pnc-Si. The latter having a lower signal. Here are the details. The fluorescent BSA was…
There has been uncertainty with process of dissolution of pnc-Si in cell growth media. Whether the media enters the pores and ‘eats away’ the material leading to increase in pore sizes and eventually complete degradation was the question. Thinning of the material would have taken place too. To have a clear picture about this, I…