Worth a read

Overview: Bob etched 4 non-porous membranes, on the backside of the membrane. HUVECs were to be grown on these etched non-porous SiO2 membranes and compared to unetched non-porous membranes. Below Bob describes how the membranes were etched: “Four of the non-porous SiO2 membranes were placed on a ø6” carrier wafer with the membrane facing up in the…

In Josh’s forthcoming paper about clogging in forward and reverse configurations using 20 nm and 100 nm sepcons, we thought there was reason to discuss how the data agrees with the already existing models of membrane fouling. In this post, Josh discusses some of his efforts to model the data without accounting for the fact…

Submitted to Acta Biomaterialia – March 15, 2014 Manuscript as PDF Check Status

Last week, I deposited silicon nitride/ amorphous silicon/ silicon nitride stack and then annealed the free standing stack after etching the substrate. The nitride film was deposited with 25W bias and the silicon film with 5W bias. The thickness for the nitride film is 30nm where it is 25nm for silicon.  One of the initial…

The image below was taken with UR’s new S/TEM, the FEI Technai F20.  It has the capability of resolving lattice images which should benefit the materials development effort.  However, we will still rely on Karen’s TEM for most of our imaging since the throughput is higher on that tool.

The unwashed membrane has a definite “film” over it which makes the pores look textured.  The MeOH & H2O seems to clear the pores up, but there are some places where there is remaining PVP that sticks to the inside walls of the pore.