The SiO2 coated samples (from W335 & W341) were found completely discolored after 5 days in DMEM (benchtop). Thus, silicon dioxide coating didn’t prevent discoloration as much as the RTP treatment. There’s a need to check the discoloration profile of the SiO2 coated samples within 5 days. Till 24 hrs. there was no discoloration observed. Also there is a need to check the stability of treated membranes in the incubator which has a higher temperature than benchtop.
Meghan and I continued to experiment with our PLA printed transwells. We came up with a protocol that has some cells growing on pnc-Si (albeit not to confluence yet), and less so on nonporous Silicon nitride. In the gallery below B2, B3, and B4 are 1060 nonporous silicon nitride SEPCONS (cells in trenches) and B5…
Last week when I reported no membrane breakage after a week of HUVEC culture, I showed a phase micrograph on day 7. This week I tracked the HUVECs a bit more closely with the microscope. This is 10X, HUVEC P5, initial seeding density of 32,500 cells/insert. I tried to capture approximately the same area on…
Introduction In previous posts by both Alec and Kayli, the urea clearance performance of our bench-top single-pass dialysis devices has been described. Results regarding devices containing untreated, PEG-treated, and nonporous membranes can be found in the “Current Dialysis Research [McGrath Lab, December 2017]”, https://trace-bmps.org/current-dialysis-research-mcgrath-lab-november-2017/ and “Updated Dialysis Research” posts. https://trace-bmps.org/updated-dialysis-research/ The nanomembranes present in these…
We have suspected that those non-open pores in the TEM image of pnc-Si are pits in the silicon membrane for a long time. Last week, I SEMed a sample, oxide (30nm)/Si(25nm)/oxide(30nm) annealed at 800C for 1min, to verify the pits features. The first figure is a TEM image which the majority feature looks like non-open…
As previously stated in my initial post (found here https://trace-bmps.org/nanomembranes-in-potassium-ion-selective-electrodes), I am in the process of developing a potassium Ion Selective Electrode (ISE) Sensor using our chips. Along the way I have gathered all sorts of curious but interesting data, with observations bringing both old discoveries and new oddities to light. Outlined below are some…
Summary The CEIS project ended in June, and I am summarizing the last few weeks of activities below by Josh and me. We did a little more work on reducing the SU-8 film stress through the processing conditions. We also succeeded in obtaining smooth poly-Si films in the RIT SMFL. We made a few test…
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This is interesting, but not surprising. These films probably need to be annealed in the RTP to stabilize them, so if the RTP only process works better, we should discuss how to best proceed at the meeting tomorrow…
I agree.
(1)RTP in O2 has best performance because this process densifies a relatively thick oxide layer.
(2)SiO2 coated (e-beam) samples have a thick oxide coverage but not densified. Thus the stability is not long lasting.
(3)RTP in Ar will densify the native oxide on silicon, so it provides an effect between RTP in O2 and SiO2 coating.
(4)UV/ozone alone only creates a very thin oxide (maybe just as thin as native oxide), thus it does not help at all.
Taking into consideration of process cycle time and cost, it looks RTP in O2 should be catered.
Again, was the DMEM with, or without serum?
Here again DMEM is with 10% FBS. I have never used DMEM w/o FBS for discoloration studies before.