As the title states, these are images from the monolithically fabricated devices used by Kyle and Vincent in Ottawa. These devices were fractured with tweezers, then tilted and metallized with 5 nm of Pt, mounted on carbon tape.
Sabrina’s post showed that on a bench top, with ‘blood’ source and return at ATM, the transmembrane burst pressure was between 0.5 psi and 1.5 psi, (initial and after DI or PBS flow for four hours). Extrapolating from Burst pressure chip tests for the 10 mm long HD chips, we can expect the burst pressure to be somewhere between…
Last week I conducted a variety of experiments to try to make a nanofluidic transistor (a device described in detail in this previous journal club post). I did some light optimization of the E-beam deposition of Ag films over a 3nm Ti adhesion layer in the PVD lesker machine and found that 12nm of Ag gives…
Recently, several studies on Staphylococcus aureus (S. aureus) have been hindered due to poor performance from assays using the µSiM-Canalicular Array (CA). As discussed here, we attempted to improve assay performance by coating our membranes with fibronectin. This did not work well and instead left us in a state of confusion as we did not…
The movable cutoff gels were more or less successful, but were too dirty for publication (see knowledge page). I’ve been trying to rerun them so that they look nicer, but the darker stain that I used has brought out a few new observations. The first gel following this paragraph is the new gel. The second…
I’m currently trying to compare separations between different complex protein mixture. This was my first crack at depleted human serum. This mixture has been processed so that the most common blood proteins (such as albumin and immunoglobulins) have been removed. All three trials were performed using membranes from w338 in diffusion mode. 338 has a…
Phase II submission August 1, 2016 or January 30, 2017 UR Tasks – Biocompatibility by Feb. 1 2016 Channel design optimization by November 2015
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Thanks for getting these Greg. A few comments: The first montage, you point out the large under etch…this was a known condition that was expected. Its due to the XeF2 gas, which is very isotropic. As for the debris, this is also a known condition, also due to the XeF2, I believe this is due to contaminates in the poly-Si as deposited (at RIT) and because the selectivity of XeF2 is absurdly high, it does not etch at all. I do not think these ‘crumbs’ would interfere with pore formation since they are not continuous, and since the pores are actually enlarging, they probably are being dissolved in the KCl solution (and therefore not plugging the pore).