Integrated Nano Developer Flow Rates
This experiment compares the metal developer used in Integrated Nano Technologies’ device to to the flow properties of water. Using the pressure cell at 3 psi, with no allyl treatment, for 10 minutes, and 200 microliters of liquid, I pushed water and developer through our membranes and examined the difference in flow rates. All of the chips used were from the outside of the 4th quadrant from ITC 3.11. The goal was to see if the developer had any unusual flow properties that drastically differ from water.
From this experiment, I saw that water had an average flow rate of 73.3 microliters/10 minutes with a standard error of 29.3. The developer had an average flow rate of 69.5 microliters/10 minutes with a standard error of 16.3. Although the means are very similar there are large error bars associated with this data. The reason for this is the small sample size as well as the inherent nature of the ITC wafers. We have seen very large variations in porosity from different parts of ITC wafers. This variation could have caused the varying flow rates. The important finding form this experiment is that the developer showed is capable to match the flow rates seen in water. Since Integrated Nano Technology uses very small volumes, this data shows it is reasonable to pass their developer in very short periods of time. Additionally, our more recent high porosity material will show significantly higher flow rates.