IV curve analysis of 20 nm NPN

These chips were 2.9 mm TEM grid with a single 25 um window.  20 nm thick NPN is covered with 100 nm TEOS with a 2 um opening to expose ~1000 pores.  Wafer number 2176.

Following are IV curve analyses for the above material as well as membranes treated with ALD alumina. These were measured in Vincent Tabard-Cossa’s lab.

20nm_NPN_I-V_analysis

20nm_NPN+ALD_I-V_analysis

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