IV curve analysis of 20 nm NPN
These chips were 2.9 mm TEM grid with a single 25 um window. 20 nm thick NPN is covered with 100 nm TEOS with a 2 um opening to expose ~1000 pores. Wafer number 2176.
Following are IV curve analyses for the above material as well as membranes treated with ALD alumina. These were measured in Vincent Tabard-Cossa’s lab.
