Katia Lyubarskaya in Alex Shestopalov’s lab has been testing different surface conditions of oxidised NPN membranes. I’ve placed her data below. (We used chips from wafer 1070) We started by looking at chips that received different chemical/plasma/thermal processes to create an oxide layer. The thermally treated sample has a significantly higher Oxygen peak, but…
von_der_Mark_2012 Here is some data on cell growth on different porosity TiO2 nanotubes. The above paper is an earlier publication regarding the work presented in Poster form at PSST 2014. Below are photos taken from the 4 quadrants of the poster.
The International Conference for Porous Semiconductors Science and Technology, 2014, was last week in Benidorm, Spain. Jim was kind enough send me to represent NRG. Dave Fang gave a great talk at PSST based on pnc-Si data in 2010. Here is a pdf of all the abstracts: PSST 2014-Abstracts A quick summary would break the…
I’ve been trying to do separations with the NPN 5-slot filters by driving the solution with a syringe pump. This type of separation is required by INT for use in their cartridge. Unfortunately, at most concentrations, solutions with fluorospheres tend to stop flowing after 20-30 µL of filtrate is collected. We believe their is a…
Our first attempt to “reverse” centrifuge materials using our standard 5-slot filters made of NPN from wafer 1070 are detailed in a previous post using GEN2 SEPCON assemblies. In this post we modify our method to more closely match the Sartorius Centrisart approach. To that end, we switch to using GEN3 SEPCONs because they are easier…
Back in November we were visited by Tom Berkelman of BioRad to see if he could use our NPN membranes to successfully separate some proprietary nanoparticles from IgG in a solvent with secret ingredients. These particles have an interesting absorbance spectrum as well as strong fluorescence. During that visit and in subsequent separations in the…
(Meghan Kazanski actually did all the work, but she didn’t have a login when this post was started.) The calculated porosity is 16.4 % with an average pore diameter of 417 nm. SepCon assembly was performed with chips from wafer 4409. Assembly was performed systematically – SepCons were boxed following assembly for later control…
I updated the software for the SSI. The software seems to be working properly. There are some differences, most of which I haven’t fully explored. Notably, we can open and view log files easily with 3.8. It seems that we may need to alter all of our current recipes to make them compatible with 3.8….
Hopefully many more details to follow, but JP, Josh M. and I doped some Si substrates with boron using a spin-on-glass. It seems well known that heavily boron doped Si is more resistant to EDP etch than intrinsic or n-type material. We went big and used the 3-slot SEPCON mask. So at…
The group in the attached paper have found a way to form pnc-Si using PECVD. They use a 300-15-300 nm OSO stack with a 850 C (50 C/s, 30 s) RTP to form ~13 nm pores. SiMPore attempted this in the past, but was not able to form pores. Using PECVD would be faster than our…