Production from week 5.5.2008
Last week’s production yielded two wafers (502 & 504) with defect-free membranes. 506 had a high pinhole density. These wafers have a TEOS mask and were annealed twice; the first anneals did not produce pores so they were annealed again at 1000 C. From these results, it seems that the first anneal “seeds” pore formation…